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Advances in Materials Science Research. Volume 33
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Editors: Alyssa R. Jost
Book Description:
This book focuses on studying the growth, properties and applications of inorganic, organic and molecular thin films. Inorganic thin films are important for semiconductor circuits, photovoltaic devices and protective coatings. Organic thin films play a critical role in chemical sensors, optical liquid crystal displays and in surface chemistry on atmospheric aerosols. Molecular solid films are essential in understanding heterogeneous atmospheric chemistry on cloud and aerosol particles. This book brings together new and exciting research in this field.

Table of Contents:
Preface

Chapter 1. High-Rate and Low-Temperature Film Growth Technology using Stable Glow Plasma at Atmospheric Pressure; pp. 1-50
(Hiroaki Kakiuchi, Hiromasa Ohmi and Kiyoshi Yasutake, Osaka Univ., Japan)

Chapter 2. Fundamental Processes in Plasma-Assisted Sputtering Deposition of Silicon and Aluminum Thin Films; pp. 51-68
(A. Palmero, Utrecht Univ., the Netherlands)

Chapter 3. Thermoplasmonics in Thin Metal Films; pp. 69-109
(A. Passian, A.L. Lereu, ICFO, Spain and R.H. Farahi et al., Oak Ridge National Laboratory, USA)

Chapter 4. TF_Quantif: A Quantification Procedure for Electron Probe Microanalysis of Thin Films on Heterogeneous Substrates; pp. 111-126 (N. Dumeliť, H. Benhayoune and G. Balossier, INSERM ERM, France)

Chapter 5. Self-Organized Growth of Polymer Wire Networks with Designed Molecular Sequences for Wavefunction-Controlled Nano Systems; pp. 127-163
(Tetsuzo Yoshimura, Tokyo Univ. of Technology, Japan)

Chapter 6. Nanoscale Static and Dynamic Domain Structures of Ferroelectric Thin Films; pp. 165-192
(Huizhong Zeng and Jingsong Liu, Univ. of Eelctronic Science and Technology of China, P.R. China)

Chapter 7. Dynamic Functions of Supramolecular Elements Embedded on Thin Films; pp. 193-226
(Katsuhiko Ariga, NIMS, Japan)

Chapter 8. Phase Diagram of the Growth Mode and Surface Morphology Dynamics in Layer Epitaxial Growth; pp. 227-247
(Vladimir I. Trofimov, Insitute of Radioengineering and Electronics of RAS, Russia and Jong-Il Kim, CN-Regional Innovation Agency, Korea)

Chapter 9. Derivation of the Ruderman-Kittel-Kasuya-Yosida Interaction in thin Films; pp. 249-277
(Tadeusz Balcerzak, Univ. of Lůdz, Poland)

Index

   Binding: Hardcover
   Pub. Date: 2007
   Pages: 288 pp.
   ISBN: 978-1-60021-455-4
   Status: AV
  
Status Code Description
AN Announcing
FM Formatting
PP Page Proofs
FP Final Production
EP Editorial Production
PR At Prepress
AP At Press
AV Available
  
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